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6" Fab For Sale from Moov - Click Here to Learn More
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SpectraCD

概述

SpectraCD system, introduced in June 2001, provides non-destructive simultaneous and extensive CD, feature shape, and film-thickness measurements from a single tool, making it one of the industry's lowest cost-of-ownership, production-worthy CD metrology systems for 193nm lithography applications and sub-100nm device production.

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