描述
無描述配置
無配置OEM 代工型號說明
The Nanometrics Atlas™ is an advanced metrology system that can accommodate both 200 or 300 mm wafer metrology. It features a dual-arm robot, high-precision stage, and high-speed focus system. The system also boasts robust pattern recognition, improved thickness reproducibility, and superior throughput. The N2000 software interface and advanced automation are compliant with industry standards, and the NanoNet feature provides system-to-system matching and seamless recipe transferability. The Atlas can be configured with a combination of metrology modules, including Spectroscopic Reflectometer (SR), Spectroscopic Ellipsometer (SE), Optical Critical Dimension (OCD), Diffraction Based Overlay (DBO), and Wafer Stress/Bow.文檔
無文檔
ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS
已驗證
類別
Thin Film / Film Thickness
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
34648
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS
類別
Thin Film / Film Thickness
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
34648
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The Nanometrics Atlas™ is an advanced metrology system that can accommodate both 200 or 300 mm wafer metrology. It features a dual-arm robot, high-precision stage, and high-speed focus system. The system also boasts robust pattern recognition, improved thickness reproducibility, and superior throughput. The N2000 software interface and advanced automation are compliant with industry standards, and the NanoNet feature provides system-to-system matching and seamless recipe transferability. The Atlas can be configured with a combination of metrology modules, including Spectroscopic Reflectometer (SR), Spectroscopic Ellipsometer (SE), Optical Critical Dimension (OCD), Diffraction Based Overlay (DBO), and Wafer Stress/Bow.文檔
無文檔