ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

ZEISS / CARL ZEISS

LIBRA® 120 combines an improved 120kV column together with the well proven elements of the versatile In-column OMEGA filter, the patented Koehler illumination system, and the digitally controlled electron optics. These elements combined with new, completely redeveloped electronics and the innovative Graphical User Interface (GUI) makes 120 an outstanding EFTEM for better results in imaging, element analysis, low dose, and remote controlled 3D experiments.

LIBRA 120

ZEISS / CARL ZEISS

LIBRA 120

TEM

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LIBRA 120

TEM

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