The superior electron optical column design concept from the predecessor instrument with its digital control of all lenses was consistently redefined in the LIBRA® 120 PLUS. It incorporates the proven in-column OMEGA energy filter and the four lens Koehler condenser system. Further improvements were achieved with regard to lower aberration coefficients of the objective lens, new lens coils, stability of electronics, and an even more versatile and stable condenser and slit aperture. The schematic design and beam path with the energy slit aperture in place is shown to the right.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

LIBRA 120 plus

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