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NSR-2205i14E
概述
The system offers a resolution of 0.35 microns utilizing a 365 nanometer wavelength I-line lens. It can process 87 or more 200mm wafers per hour with an alignment accuracy of 50nm or higher. The exposure area measures 22x22mm, and it has a reduction ratio of five to one.
活躍中的上架商品
2
服務
檢驗、保險、評估、物流
