ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

ASML

The TWINSCAN XT:400G 365-nm Step-and-Scan system is an ultra high-productivity, dual-stage lithography tool designed for volume 300-mm wafer production at 350-nm resolution. The dual wafer-stage technology of the TWINSCAN platform enables the exposure of one wafer and the alignment and mapping of the next wafer to take place in parallel, thereby virtually eliminating overhead time and allowing for continuous patterning of wafers.

ASML

TWINSCAN XT:400G

Steppers & Scanners

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TWINSCAN XT:400G

Steppers & Scanners

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