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ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
  • ASML TWINSCAN XT:1900Gi
描述
(1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
配置
The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
OEM 代工型號說明
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
文檔
類別
Steppers & Scanners

上次驗證: 超過30天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

105053


晶圓尺寸:

12"/300mm


年份:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ASML

TWINSCAN XT:1900Gi

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已驗證
類別
Steppers & Scanners
上次驗證: 超過30天前
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/13ac333a987642f4a4bdd6b44b0bb473_c302b0aabbe6472a98bb87646ecc0f391201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/5fa191f9d0224d35b23636871bd01b11_cd74f47b816b43ef91be208953c707751201a_mw.jpeg
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listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/fae93219e83a412a988bef863f46a6ef_b5b3e2ddf3874ea5b3658d809d31e49e1201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/2e9bc82132514f44b1c9d2616be13792_44853d704610440ab58a5ec8d69fd22f1201a_mw.jpeg
listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/80af2d6360614e7d90bb70ca216ce786_8c8e5cc6278e4ceb9328b644c96fc551_mw.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

105053


晶圓尺寸:

12"/300mm


年份:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
(1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
配置
The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
OEM 代工型號說明
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
文檔