![ASML TWINSCAN XT:1900Gi](https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-large.png)
描述
無描述配置
The cymer laser is EOL. Asset Description: 193nm ASML Immersion scanner Software Version: 5.1 CIM: SECS Process: 40/45nm backend Main System main body 1 OK CYMER laser 1 OK MCWC 1 OK main body 1 OK WISR 1 OK WICR 1 OK flter cabinet 1 OK LCWC 1 OK ACC 1 OKOEM 代工型號說明
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.文檔
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ASML
TWINSCAN XT:1900Gi
已驗證
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105053
晶圓尺寸:
12"/300mm
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部ASML
TWINSCAN XT:1900Gi
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105053
晶圓尺寸:
12"/300mm
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
The cymer laser is EOL. Asset Description: 193nm ASML Immersion scanner Software Version: 5.1 CIM: SECS Process: 40/45nm backend Main System main body 1 OK CYMER laser 1 OK MCWC 1 OK main body 1 OK WISR 1 OK WICR 1 OK flter cabinet 1 OK LCWC 1 OK ACC 1 OKOEM 代工型號說明
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.文檔
無文檔