描述
PVD / Sputter Missing Part: HDD配置
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2setOEM 代工型號說明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文檔
無文檔
APPLIED MATERIALS (AMAT)
ENDURA II
已驗證
類別
PVD / Sputtering
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
44740
晶圓尺寸:
12"/300mm
年份:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部APPLIED MATERIALS (AMAT)
ENDURA II
已驗證
類別
PVD / Sputtering
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
44740
晶圓尺寸:
12"/300mm
年份:
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
PVD / Sputter Missing Part: HDD配置
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2setOEM 代工型號說明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文檔
無文檔