概述

The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).