描述
2 Chambers RTP XE, 2 Cool Down配置
2 Chambers RTP XE, 2 Cool DownOEM 代工型號說明
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.文檔
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APPLIED MATERIALS (AMAT)
CENTURA RTP
已驗證
類別
RTP/RTA
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105341
晶圓尺寸:
8"/200mm
年份:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA RTP
類別
RTP/RTA
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105341
晶圓尺寸:
8"/200mm
年份:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
2 Chambers RTP XE, 2 Cool Down配置
2 Chambers RTP XE, 2 Cool DownOEM 代工型號說明
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.文檔
無文檔