AccuThermo AW610
類別
RTP/RTA概述
The AccuThermo AW610 was derived from the AG Associates 610 production-proven design. The system uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1-600 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.
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