描述
無描述配置
Process: METAL From original tool PO, please inspect to verify FI SN: 1001862-04-43-06689 2300 Versys METAL chamber SN: 23MT0485 (F97598-PM2) & 23MT0326 (F80744-PM4) 2300MW STRIPER Chamber: 23MWS133 & 23MWS134 2300 System Software Revision 1.7.4-SP2-Release Factory Automation OHT PIO Sensor Wafer Size Diameter 300+/- 0.05mm(SEMI M28), 775 +/- 25um, Notch Carrier FOUP (Comply with SEMI E47.1 (25wafers)) Inter Face 3 carrier stage (Continuous flow operation) Platform Type Version 2 UPS on system Yes Earth Leakage Breaker Yes Gas Box Transport Module, 9 Lines enhance GAS BOX. Monitor 2 (Flat Panel Display, 1; Front, 1; Side) Signal Tower "Red/Yellow/Green/Blue (Upper Left of Front x1 & Upper right section of loader on maintenance side x1)" EMO Front x2, Rear x6 Conditioning Stage NO,4 slots cooling station Foreline Heated Interconnect Cables TM to sub-panel, 50 ft TCU to PM 50 ft PM to Pump Interconnect 50 ft Inter Locks Gas Box Door (I/L Signal is sent to the Factory) RF Generator Bias GEN,13MHZ,RFDS,COMPACT,960W RF Generator Source GEN,APEX,1.5KW,13.56 MHZ,REV. G RF Bias Cable 11 Feet RF Cable Bias, 11FT RF Source Cable 18 Feet RF Cable TCP, 18FT Bias Match (FRU) FRU, ASSY, BIAS MTCH, VIOP TCP Match (FRU) FRU, ASSY, TCP MTCH, VIOP Coil Assembly COIL,OTR SEG,EXT,OPP ESC, Assy, 300mm bipolar ESC VCI PCBA,VCI/BICEP II SCALING PCB ESC POWER SUPPLY Wafer ID Reader NO WIDS Bottom Read Carrier ID Reader Brooks load port with HERMOS tag-reader 2300 Versys METAL Options Chamber type 2300 Versys METALx2, 2300MW STRIPERX2 Endpoint type "Optical Emission Spectroscopy" ESC type Bipolar ESC Focus ring Ceramic TMP TMP-EDWARDS STP-2203LVS3(PM3,)Alcatel ATH2300M (PM2) Transfer Module Backing Pump EPX 180N Chamber Isolation Valve bounded door Wafer Lift Mechanism Direct Drive Damage/Missing parts list Please inspect tool to reconfirm Dry pumps not included on sales GAS BOX 2,3 Gas Position 1 BCL3/ 200 GAS POSITION 2 CL2/500 GAS POSITION 3 O2/100 GAS POSITION 4 CHF3/50 GAS POSITION 5 Ar/500 GAS POSITION 6 CH4/20 GAS POSITION 7 HCL/200 GAS POSITION 8 O2/1000 GAS POSITION 9 N2/50 Non-standard PM/GB Feature 9 Lines enhance GAS BOX. ON BOARD GAS PANEL 1,4 STRIPPER GAS POSITION 1 N2/1000 STRIPPER GAS POSITION 2 O2/5000 PROCESS KIT CONFIGURATION(S) PM2,3 Focus Ring Focus Ring BASE Focus Ring BASE Focus Ring LINER upper LINER upper LIN MTG PL ESC LIN MTG PL ESC TCP Window TCP Window Metal Gas Nozzle Metal Gas Nozzle Metal Gas Tunnel Metal Gas Tunnel GDP GDP PLATE,SEAL,THRM ISO PLATE,SEAL,THRM ISO LINER, LOWER, ESC COVER LINER, LOWER, ESC COVER LINER,CHMBR,LWR LINER,CHMBR,LWR PENDULUM,VAT PENDULUM,VAT LOCK,VAT LOCK,VAT Al Liner chamber upper Al Liner chamber upper Al baffle, chamber Al baffle, chamber Damage/Missing parts list Please inspect tool to reconfirm Dry pumps not included on salesOEM 代工型號說明
The 2300 Versys Metal L is part of Lam’s Versys Metal product family, which provides high-productivity capability on a flexible platform for performing critical etch steps in the semiconductor manufacturing process. The technology used is Reactive Ion Etch, and it provides solutions for interconnects. The product is designed to address industry challenges such as achieving repeatable profile and critical dimension control while maintaining high-volume, low-cost production. It offers superior CD, profile uniformity, and uniformity control, enabled by a symmetrical chamber design with independent process tuning features. Additionally, it has high availability, high yield, and exceptional process repeatability with proprietary chamber cleaning technology. The product is upgradable for low cost of ownership over several device generations. Key applications include TiN metal hardmask, high-density aluminum line, and aluminum pad.文檔
無文檔
LAM RESEARCH CORPORATION
2300 VERSYS METAL L
已驗證
類別
RIE
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
19948
晶圓尺寸:
12"/300mm
年份:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部無類似上架商品
LAM RESEARCH CORPORATION
2300 VERSYS METAL L
已驗證
類別
RIE
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
19948
晶圓尺寸:
12"/300mm
年份:
2004
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Process: METAL From original tool PO, please inspect to verify FI SN: 1001862-04-43-06689 2300 Versys METAL chamber SN: 23MT0485 (F97598-PM2) & 23MT0326 (F80744-PM4) 2300MW STRIPER Chamber: 23MWS133 & 23MWS134 2300 System Software Revision 1.7.4-SP2-Release Factory Automation OHT PIO Sensor Wafer Size Diameter 300+/- 0.05mm(SEMI M28), 775 +/- 25um, Notch Carrier FOUP (Comply with SEMI E47.1 (25wafers)) Inter Face 3 carrier stage (Continuous flow operation) Platform Type Version 2 UPS on system Yes Earth Leakage Breaker Yes Gas Box Transport Module, 9 Lines enhance GAS BOX. Monitor 2 (Flat Panel Display, 1; Front, 1; Side) Signal Tower "Red/Yellow/Green/Blue (Upper Left of Front x1 & Upper right section of loader on maintenance side x1)" EMO Front x2, Rear x6 Conditioning Stage NO,4 slots cooling station Foreline Heated Interconnect Cables TM to sub-panel, 50 ft TCU to PM 50 ft PM to Pump Interconnect 50 ft Inter Locks Gas Box Door (I/L Signal is sent to the Factory) RF Generator Bias GEN,13MHZ,RFDS,COMPACT,960W RF Generator Source GEN,APEX,1.5KW,13.56 MHZ,REV. G RF Bias Cable 11 Feet RF Cable Bias, 11FT RF Source Cable 18 Feet RF Cable TCP, 18FT Bias Match (FRU) FRU, ASSY, BIAS MTCH, VIOP TCP Match (FRU) FRU, ASSY, TCP MTCH, VIOP Coil Assembly COIL,OTR SEG,EXT,OPP ESC, Assy, 300mm bipolar ESC VCI PCBA,VCI/BICEP II SCALING PCB ESC POWER SUPPLY Wafer ID Reader NO WIDS Bottom Read Carrier ID Reader Brooks load port with HERMOS tag-reader 2300 Versys METAL Options Chamber type 2300 Versys METALx2, 2300MW STRIPERX2 Endpoint type "Optical Emission Spectroscopy" ESC type Bipolar ESC Focus ring Ceramic TMP TMP-EDWARDS STP-2203LVS3(PM3,)Alcatel ATH2300M (PM2) Transfer Module Backing Pump EPX 180N Chamber Isolation Valve bounded door Wafer Lift Mechanism Direct Drive Damage/Missing parts list Please inspect tool to reconfirm Dry pumps not included on sales GAS BOX 2,3 Gas Position 1 BCL3/ 200 GAS POSITION 2 CL2/500 GAS POSITION 3 O2/100 GAS POSITION 4 CHF3/50 GAS POSITION 5 Ar/500 GAS POSITION 6 CH4/20 GAS POSITION 7 HCL/200 GAS POSITION 8 O2/1000 GAS POSITION 9 N2/50 Non-standard PM/GB Feature 9 Lines enhance GAS BOX. ON BOARD GAS PANEL 1,4 STRIPPER GAS POSITION 1 N2/1000 STRIPPER GAS POSITION 2 O2/5000 PROCESS KIT CONFIGURATION(S) PM2,3 Focus Ring Focus Ring BASE Focus Ring BASE Focus Ring LINER upper LINER upper LIN MTG PL ESC LIN MTG PL ESC TCP Window TCP Window Metal Gas Nozzle Metal Gas Nozzle Metal Gas Tunnel Metal Gas Tunnel GDP GDP PLATE,SEAL,THRM ISO PLATE,SEAL,THRM ISO LINER, LOWER, ESC COVER LINER, LOWER, ESC COVER LINER,CHMBR,LWR LINER,CHMBR,LWR PENDULUM,VAT PENDULUM,VAT LOCK,VAT LOCK,VAT Al Liner chamber upper Al Liner chamber upper Al baffle, chamber Al baffle, chamber Damage/Missing parts list Please inspect tool to reconfirm Dry pumps not included on salesOEM 代工型號說明
The 2300 Versys Metal L is part of Lam’s Versys Metal product family, which provides high-productivity capability on a flexible platform for performing critical etch steps in the semiconductor manufacturing process. The technology used is Reactive Ion Etch, and it provides solutions for interconnects. The product is designed to address industry challenges such as achieving repeatable profile and critical dimension control while maintaining high-volume, low-cost production. It offers superior CD, profile uniformity, and uniformity control, enabled by a symmetrical chamber design with independent process tuning features. Additionally, it has high availability, high yield, and exceptional process repeatability with proprietary chamber cleaning technology. The product is upgradable for low cost of ownership over several device generations. Key applications include TiN metal hardmask, high-density aluminum line, and aluminum pad.文檔
無文檔
類似上架商品
查看全部無類似上架商品