描述
無描述配置
Tool Status: In production. Configuration attached in a separate document. Audit to verify <b>Additional Information:</b><span style="font-family: Symbol;">·</span><span style="font-size: 7pt;"> </span>The hard drive will be removed. The system will come with no operating software.OEM 代工型號說明
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.文檔
無文檔
LAM RESEARCH CORPORATION
2300 VERSYS KIYO
已驗證
類別
RIE
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
17085
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 VERSYS KIYO
已驗證
類別
RIE
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
17085
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Tool Status: In production. Configuration attached in a separate document. Audit to verify <b>Additional Information:</b><span style="font-family: Symbol;">·</span><span style="font-size: 7pt;"> </span>The hard drive will be removed. The system will come with no operating software.OEM 代工型號說明
The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.文檔
無文檔