KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

The KLA 301 Reticle Inspection System and the KLA 50 Reference Data Computer together form the KLA 351 Inspection System, which represents a major advance in speed, sensitivity and flexibility. The KLA 351 offers the highest inspection sensitivity available in the marketplace, which the Company believes is vital to meet reticle inspection requirements for today's more complex microprocessors and larger DRAMs. This dedicated image processor employs a flexible system architecture which permits future upgrades and enhancements through software, rather than hardware changes. Furthermore, the KLA 351's optics include a rotating telescope turret to provide three sensitivities in one system. The KLA 351 offers flexibility for users who need a versatile inspection system to address the inspection needs of both the most demanding and the more routine semiconductor manufacturing processes. Users may obtain higher throughput by selecting lower sensitivity inspections.

KLA

351

Reticle / Mask Inspection

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351

Reticle / Mask Inspection

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