概述

The new Applied ALTA 4700DP system is part of a suite of powerful solutions offered for the fabrication and inspection of photomasks, including Sigmameltec™ resist-processing/cleaning products; Centura® Tetra™ EUV and optical mask etch systems; and the Applied Aera5™ Mask Inspection system. Advanced masks are 6-inches square (figure 1), but masks used for legacy wafer production include several other sizes and are mostly written by the large installed base of ALTA 3000-series laser writers