描述
This reactor is equipped for As/P material deposition. I think the previous user used it for GaAs deposition. Electrically it was performing OK, but now the front panel was turned off. We expect this to need a small fix, maybe something was unplugged, but the hardware should be OK. Lid cannot be opened now because we took the closed position sensors from the lid. Load lock can pump down but not backfill, probably a small issue.配置
In December 2021, the following functionality was proven: Heat-up to 600C Hydrogen flow Reactor pumpdown Not proven: MFC/valve functionality for process gas source linesOEM 代工型號說明
The AIXTRON G3 is a commercial MOCVD (Metal-Organic Chemical Vapor Deposition) system featuring a planetary cold-wall reactor design. This system exhibits an abrupt temperature gradient near the substrate, with the highest temperature at the substrate and a rapid decrease along the surface normal direction. This controlled temperature profile ensures precise and efficient epitaxial growth of compound semiconductor materials, making it suitable for various applications, including the production of optoelectronic devices like LEDs and laser diodes.文檔
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AIXTRON
G3
已驗證
類別
MOCVD
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66553
晶圓尺寸:
2"/50mm, 3"/75mm
年份:
2000
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Refurbishment Services
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AIXTRON
G3
已驗證
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66553
晶圓尺寸:
2"/50mm, 3"/75mm
年份:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
This reactor is equipped for As/P material deposition. I think the previous user used it for GaAs deposition. Electrically it was performing OK, but now the front panel was turned off. We expect this to need a small fix, maybe something was unplugged, but the hardware should be OK. Lid cannot be opened now because we took the closed position sensors from the lid. Load lock can pump down but not backfill, probably a small issue.配置
In December 2021, the following functionality was proven: Heat-up to 600C Hydrogen flow Reactor pumpdown Not proven: MFC/valve functionality for process gas source linesOEM 代工型號說明
The AIXTRON G3 is a commercial MOCVD (Metal-Organic Chemical Vapor Deposition) system featuring a planetary cold-wall reactor design. This system exhibits an abrupt temperature gradient near the substrate, with the highest temperature at the substrate and a rapid decrease along the surface normal direction. This controlled temperature profile ensures precise and efficient epitaxial growth of compound semiconductor materials, making it suitable for various applications, including the production of optoelectronic devices like LEDs and laser diodes.文檔
無文檔