The AIXTRON G4 HT (High-Temperature) is a state-of-the-art metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This advanced system is specifically designed for epitaxial growth of compound semiconductor materials, with a particular focus on applications that require high-temperature processing. Its precise and controlled growth capabilities enable the creation of high-quality semiconductor layers, making it a vital tool for manufacturing cutting-edge optoelectronic devices, high-power transistors, and other semiconductor components requiring high-temperature processing for superior performance.

The AIXTRON Group provides deposition equipment to the semiconductor industry. They are used for a wide range of manufacturing high-performance components for electronic and optoelectronic applications based on compound or organic semiconductor materials. These components are used in a variety of innovative applications, technologies and industries. These include, for example, LED and display technology, data transmission, sensor technology, energy management and conversion, communication, signal and lighting technology, and many other sophisticated high-tech applications.

G4 HT

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