概述

The MLX-3000N is a multi-chamber sputtering system that offers a flexible modular configuration with up to 5 process chambers and a random access robotic wafer transfer. It includes a unique dual pole, electromagnetic sputter source, a low damage high-rate etch-cleaning, and a new wafer heating method. These features, combined with improved process technology for R&D production, make the MLX-3000N a flexible and versatile system for various applications.