跳到主要內容

TRIASe+ HP Ti

概述

The Triase+™HP Ti, single-wafer metal CVD system, accommodates a lot of additional functions such as optimized surface treatments by unique showerhead gas dispersion module and simultaneous TiSix formation technology during Ti deposition. Furthermore the system provides widen temperature control range, lower particle level and higher productivity. Its unique technology addresses the various process requirements of metal deposition that having the structure such as ultra-shallow junction and nickel silicide contacts.

活躍中的上架商品

0

服務

檢驗、保險、評估、物流

最熱門的上架商品

    未找到產品
有類似商品?
利用 Moov 將其上架並立即找到完美的買家。