The UNITY®-EP CVD system is a state-of-the-art tool for high volume manufacturing of integrated circuits. It is based on the field-proven UNITY CVD process and offers productivity enhancements for CVD metal films. The system is designed to be space-efficient and easy to maintain, with improved process stability through the use of an upgraded heater temperature control (PCOT). The system can handle wafer sizes of 150mm and 200mm, with 1 to 4 process modules and 1 or 2 cooling modules. It can perform pre-clean, Ti, TiN processes and features plasma-free cleaning. This makes it a versatile and reliable tool for the semiconductor industry.