Manufacture, seller and service provider of APCVD and Photomask Cleaner for Semiconductor.

Continuous High Throughput APCVD for 8 inch wafers.

AMAYA

AMAX800V

Solar Cell Production Continuous High Volume APCVD for 125mm x 125mm cell and 156mm x 156mm cell.

AMAX1000S

Continuous APCVD for 12 inch wafers. 12 inch wafer. Continuous APCVD system, based on long term AMAX Series. Developed wider area deposition dispersion head and minimize the number of trays to reduce the cost of system. SiC Trays as susceptors prevent heavy metal addition and help long term stable process for long term production. Good maintainability and Operators safety are given by automated head base lifting system and automated tray exchange system, that shorten PM time for longer use of system.

AMAX1200

Continuous High Throughput APCVD for 6 inch or below. High volume production continuous APCVD to meet with user's need to process 120WPM for 6 inch and smaller wafers.
Developed wider area deposition dispersion head dedicated to A6300S and minimize the number of trays to reduce the cost of system. SiC Trays as susceptors prevent heavy metal addition and help long term stable process for long term production. Good maintainability and Operators safety are given by automated head base lifting system and automated tray exchange system, that shorten PM time for longer use of system

A6300S

Face down deposition in closed chamber by chucking wafer on heater above dispersion head realized good thermal uniformity to make good film thickness Nu, and less particle additions. Backside Gas from the backside wafer prevent backside deposition and prevent extra SiO deposition on the wall of parts of chambers. Minimized system footprint. Wafer size, 8 inch or the less.

A200V

A6300

Flexible APCVD for Pilot Production and R&D. Can place wafers on SiC tray manually. Chips or different size of wafers can be placed on SiC Tray. Small Footprint for R&D and Pilot Production.

AMAYA

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D501

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A6300

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AMAX1200

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AMAX1000S

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