Widely used in traditional gate, polysilicon and aluminum interconnect lithography applications, DARC 193 is ideal for dual damascene interconnect schemes with its excellent adhesion to low-k dielectric films.

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

PRODUCER DARC 193

類別

概述

活躍中的上架商品

服務

最熱門的上架商品

利用 Moov 將其上架並立即找到完美的買家。