概述

The Advanced Energy (AE) E-Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-dam-ascene process flow (DDPF) application. The E-Wave power supply offers up to three channels, each of which independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms