MET5
概述
EUV-L Micro-Field Exposure Tools with 0.5NA, known as MET5. The tools are used for infrastructure development required for the EUV lithography industry to support printing at the ~12nm node and below.
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EUV-L Micro-Field Exposure Tools with 0.5NA, known as MET5. The tools are used for infrastructure development required for the EUV lithography industry to support printing at the ~12nm node and below.
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檢驗、保險、評估、物流