描述
EXPOSE TOOL, SIP配置
無配置OEM 代工型號說明
The UltraTech Saturn Spectrum 300 is a stepper system used in the fabrication of semiconductors. It can handle wafers that are between 8" and 12" in size and has a resolution of 2.0 microns. The system is equipped with a robotic wafer handler, an environmental chamber, and a reticle library, as well as a light pipe that measures 44 x 26.7 mm. The illuminator can be either 1000w or 1200w and the lens alignment is automatic with enhanced global alignment. Additionally, the UltraTech Saturn Spectrum 300 features an air probe focus detector, a 3-point focus detector, and a linear motor for the X and Y stage. It also includes an MVS pattern recognition system, a closed-loop exposure dose controller, a vibration isolation system, auto-uniformity, and dynamic focus. The system is SECS II compatible and has bottom-side prism protection pellicle, dual flip aperture broadband, an intensity of 1650mW, uniformity of 7%, and a DOF of 2µm.文檔
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VEECO / ULTRATECH
SATURN SPECTRUM 300
已驗證
類別
Photolithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
101698
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
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Refurbishment Services
Available
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VEECO / ULTRATECH
SATURN SPECTRUM 300
類別
Photolithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
101698
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
EXPOSE TOOL, SIP配置
無配置OEM 代工型號說明
The UltraTech Saturn Spectrum 300 is a stepper system used in the fabrication of semiconductors. It can handle wafers that are between 8" and 12" in size and has a resolution of 2.0 microns. The system is equipped with a robotic wafer handler, an environmental chamber, and a reticle library, as well as a light pipe that measures 44 x 26.7 mm. The illuminator can be either 1000w or 1200w and the lens alignment is automatic with enhanced global alignment. Additionally, the UltraTech Saturn Spectrum 300 features an air probe focus detector, a 3-point focus detector, and a linear motor for the X and Y stage. It also includes an MVS pattern recognition system, a closed-loop exposure dose controller, a vibration isolation system, auto-uniformity, and dynamic focus. The system is SECS II compatible and has bottom-side prism protection pellicle, dual flip aperture broadband, an intensity of 1650mW, uniformity of 7%, and a DOF of 2µm.文檔
無文檔