描述

Utility Configuration: Main Equipment, Chiller (Gray), Anti-Static Device (White) -Actual Status of Equipment/Parts -Equipment: Not operational. Out of three chambers, two are broken. Automation not functional. Major parts need -replacement. -Transfer robot is broken. -Load Lock module initialization fails. -System software failure. Chiller: Requires repair. Anti-Static Device: Functional. Disposition or Usable Parts For Sale: Main equipment, chiller, anti-static device, monitor shelf. Exclusions from Sale: Pump, monitor, keyboard, chair.

配置

無配置

OEM 代工型號說明

Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head