
描述
Oxford Plasmalab 100 ICP 180 RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, Adixen ACT 1300M turbopump controller. Thermo Neslab chiller, BOM#274103200000; Leybold D65BC vacuum pump w/ oil filter & exhaust filter; Anest Iwata Scroll Meister vacuum pump; OptiTemp OTI-5WL-P3-216 chiller; gas box; control computer LCD monitor; computer cart. 64in x 29in x 49in H.配置
無配置OEM 代工型號說明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文檔
無文檔
類別
PECVD
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
135814
晶圓尺寸:
6"/150mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PLASMALAB 100
類別
PECVD
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
135814
晶圓尺寸:
6"/150mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Oxford Plasmalab 100 ICP 180 RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, Adixen ACT 1300M turbopump controller. Thermo Neslab chiller, BOM#274103200000; Leybold D65BC vacuum pump w/ oil filter & exhaust filter; Anest Iwata Scroll Meister vacuum pump; OptiTemp OTI-5WL-P3-216 chiller; gas box; control computer LCD monitor; computer cart. 64in x 29in x 49in H.配置
無配置OEM 代工型號說明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文檔
無文檔