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APPLIED MATERIALS (AMAT) PRODUCER SE
    描述
    無描述
    配置
    Technology: DCVD Mainframe Type: Producer SE Wafer Shape: SNNF Chamber Type/Location Chamber Type: SACVD Process Twin Chamber Location: Chamber A: SACVD Process Twin chamber Chamber B: SACVD Process Twin chamber Chamber C: Empty  Electrical Configuration Voltage: 208V 3Phase 4Wires Frequency: 50/60 Hz Full load Current: 240 Amperes  System Safety System Labels: English EMO Type: Turn to release General Mainframe Chamber Slit Valve: G67P Wafer in pocket sensor : Standard Buffer Robot Type : VHP robot VHP robot Driver: 0190-24962 NSK driver(ELA-B014CG7-04) VHP robot blade: 0200-06112 BLADE, CERAMIC, 300MM PRODUCER SE  Factory Interface Options  Load Port Types : TDK Load Port 02TF12718 (0190-16691)  FI Robot Robot Type: ROBOT AA, KAWASAKI PRODUCER FI 300MM(0190-10301) Robot Driver: Kawasaki 30C61C-B004 Master A Robot Controller (0190-12379)  Metrology Unit: None  Ionizing System: E78 Ionizer  Chamber Configuration  Chamber Process : Chamber A--- SACVD BPSG Chamber B--- SACVD BPSG  RF Generator: None  End point detector: NA  Process kits: Blocker Plate: 0021-25474 Faceplate: 0041-13896 GAS box: 0040-53688 LINER, CERAMIC MIDDLE, PMD SACVD 300MM : 0200-02525 PUMPING RING, PMD ETERNA, PRODUCER SE: 0020-31178 LINER, CERAMIC BOTTOM, SACVD 300MM PRODUCER: 0200-00668 Liner Ceramic Top Eterna: 0200-02414 ISOLATOR, CERAMIC, 300MM Producer : 0200-04235 300mm AMAT Producer Ceramic Heater: 0040-85475  Chamber Clean Method: Remote Plasma (RPS) Clean: (0920-00057) MKS F180131, ASTRON ex Remote Plasma source  Gauge/ Monometer Configuration: 20Torr / 1000Torr with 100 Torr 1/2 ATM Switch  Pressure Control: Throttle valve Type: 3870-03394MKS Throttle Valve 683B-23795, Type 683 Control Valve Forline Valve: 3870-03322 VALVE GATE 3" ID NW57 PNEU N/C W/O POSIT  Gas Delivery Options  Gas Delivery Gas Pallet Type: Surface Mount Vertical Regulated Gas Panel Gas Feed :Top Gas Panel Cabinet Exhaust: Top Exhaust MFC Type: Unit UFC-8565  Gas Pallet Configuration Supplement Chamber A: Stick#2: TEB Stick#8: AR Stick#12:O2 Stick#3: TEOS Stick#9: HE Stick#13: O3 Stick#4: TEPO Stick#10: HE Stick#14: N2 Stick#7: NF3 Stick#11: N2 Chamber B: Stick#2: TEB Stick#8: AR Stick#12:O2 Stick#3: TEOS Stick#9: HE Stick#13: O3 Stick#4: TEPO Stick#10: HE Stick#14: N2 Stick#7: NF3 Stick#11: N2  Remotes Options  System Monitors : Local Monitors Standalone with 1st and 2nd monitors  Ozonator Rack : Ozone Generator Rack with Astex 8407 O3 generator  Heat Exchanger/Chiller: Option  Remote AC : Facilities UPS Interface
    OEM 代工型號說明
    The Applied Materials PRODUCER SE is a chemical vapor deposition (CVD) system manufactured by Applied Materials, Inc. It is designed for depositing thin films onto semiconductor wafers in the semiconductor manufacturing process.
    文檔

    APPLIED MATERIALS (AMAT)

    PRODUCER SE

    verified-listing-icon

    已驗證

    類別
    PECVD

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    107902


    晶圓尺寸:

    12"/300mm


    年份:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) PRODUCER SE

    APPLIED MATERIALS (AMAT)

    PRODUCER SE

    PECVD
    年份: 2005條件: 二手
    上次驗證超過30天前

    APPLIED MATERIALS (AMAT)

    PRODUCER SE

    verified-listing-icon
    已驗證
    類別
    PECVD
    上次驗證: 超過60天前
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    107902


    晶圓尺寸:

    12"/300mm


    年份:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Technology: DCVD Mainframe Type: Producer SE Wafer Shape: SNNF Chamber Type/Location Chamber Type: SACVD Process Twin Chamber Location: Chamber A: SACVD Process Twin chamber Chamber B: SACVD Process Twin chamber Chamber C: Empty  Electrical Configuration Voltage: 208V 3Phase 4Wires Frequency: 50/60 Hz Full load Current: 240 Amperes  System Safety System Labels: English EMO Type: Turn to release General Mainframe Chamber Slit Valve: G67P Wafer in pocket sensor : Standard Buffer Robot Type : VHP robot VHP robot Driver: 0190-24962 NSK driver(ELA-B014CG7-04) VHP robot blade: 0200-06112 BLADE, CERAMIC, 300MM PRODUCER SE  Factory Interface Options  Load Port Types : TDK Load Port 02TF12718 (0190-16691)  FI Robot Robot Type: ROBOT AA, KAWASAKI PRODUCER FI 300MM(0190-10301) Robot Driver: Kawasaki 30C61C-B004 Master A Robot Controller (0190-12379)  Metrology Unit: None  Ionizing System: E78 Ionizer  Chamber Configuration  Chamber Process : Chamber A--- SACVD BPSG Chamber B--- SACVD BPSG  RF Generator: None  End point detector: NA  Process kits: Blocker Plate: 0021-25474 Faceplate: 0041-13896 GAS box: 0040-53688 LINER, CERAMIC MIDDLE, PMD SACVD 300MM : 0200-02525 PUMPING RING, PMD ETERNA, PRODUCER SE: 0020-31178 LINER, CERAMIC BOTTOM, SACVD 300MM PRODUCER: 0200-00668 Liner Ceramic Top Eterna: 0200-02414 ISOLATOR, CERAMIC, 300MM Producer : 0200-04235 300mm AMAT Producer Ceramic Heater: 0040-85475  Chamber Clean Method: Remote Plasma (RPS) Clean: (0920-00057) MKS F180131, ASTRON ex Remote Plasma source  Gauge/ Monometer Configuration: 20Torr / 1000Torr with 100 Torr 1/2 ATM Switch  Pressure Control: Throttle valve Type: 3870-03394MKS Throttle Valve 683B-23795, Type 683 Control Valve Forline Valve: 3870-03322 VALVE GATE 3" ID NW57 PNEU N/C W/O POSIT  Gas Delivery Options  Gas Delivery Gas Pallet Type: Surface Mount Vertical Regulated Gas Panel Gas Feed :Top Gas Panel Cabinet Exhaust: Top Exhaust MFC Type: Unit UFC-8565  Gas Pallet Configuration Supplement Chamber A: Stick#2: TEB Stick#8: AR Stick#12:O2 Stick#3: TEOS Stick#9: HE Stick#13: O3 Stick#4: TEPO Stick#10: HE Stick#14: N2 Stick#7: NF3 Stick#11: N2 Chamber B: Stick#2: TEB Stick#8: AR Stick#12:O2 Stick#3: TEOS Stick#9: HE Stick#13: O3 Stick#4: TEPO Stick#10: HE Stick#14: N2 Stick#7: NF3 Stick#11: N2  Remotes Options  System Monitors : Local Monitors Standalone with 1st and 2nd monitors  Ozonator Rack : Ozone Generator Rack with Astex 8407 O3 generator  Heat Exchanger/Chiller: Option  Remote AC : Facilities UPS Interface
    OEM 代工型號說明
    The Applied Materials PRODUCER SE is a chemical vapor deposition (CVD) system manufactured by Applied Materials, Inc. It is designed for depositing thin films onto semiconductor wafers in the semiconductor manufacturing process.
    文檔
    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) PRODUCER SE

    APPLIED MATERIALS (AMAT)

    PRODUCER SE

    PECVD年份: 2005條件: 二手上次驗證:超過30天前
    APPLIED MATERIALS (AMAT) PRODUCER SE

    APPLIED MATERIALS (AMAT)

    PRODUCER SE

    PECVD年份: 2004條件: 二手上次驗證:超過60天前
    APPLIED MATERIALS (AMAT) PRODUCER SE

    APPLIED MATERIALS (AMAT)

    PRODUCER SE

    PECVD年份: 2007條件: 二手上次驗證:超過60天前