概述

The Archer 500 is a high-performance overlay metrology system for advanced patterning processes. It offers improved precision, measurement speed, and meets strict specifications for overlay error on multi-patterning lithography layers. The Archer 500 utilizes an innovative multi-layer target to provide precise, fast feedback on overlay error. Improvements to the optical subsystems and platform result in better overlay measurement specifications than the previous-generation Archer 300. New illumination options enable overlay measurement capability on a wide range of lithography layers. The Archer 500 is suitable for multi-patterning technologies, in-line monitoring, and scanner qualification. It seamlessly integrates with K-T Analyzer and Recipe Database Manager to improve fab productivity.