概述

The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.