The TurboDisc K465i GaN MOCVD System is a production-proven system that provides high productivity for HB LED high-volume production fabs around the globe. It is known for its highest productivity and best-in-class yields. The K465i achieves up to 90% yield (5nm bin) due to its superior uniformity and excellent run-to-run repeatability. It also offers high productivity due to its full automation and shortened recovery period after maintenance.

VEECO

K465i

K465

E300

E450

MaxBright

K475i

TURBODISC ENTERPRISE 300 II

RuCVD

IBD 350

IBE C-1

EPIK700

Veeco’s Propel™ MOCVD system is designed as a flexible platform for early stage research and development and small production needs for nitride applications. The reactor is capable of processing 9×2”, 3×4”, 1×6” and 1×8” on various substrates such as silicon, sapphire and silicon carbide without any hardware modification between runs.The system deposits high-quality GaN films for multiple applications such as power, RF, & photonics. The R200 reactor is based on Veeco’s leading TurboDisc® design including the IsoFlange™ and SymmHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from Veeco D180, K465i™ or MaxBright™ systems to the Propel GaN MOCVD platform.

Propel

K475

Propel HVM 

VEECO

概述

活躍中的上架商品

全部產品

服務

最熱門的 VEECO MOCVD

K465i

K465

E300

E450

利用 Moov 將其上架並立即找到完美的買家。

所有 VEECO MOCVD