AIX G5+ C Planetary Reactor for GaN on 150/200 mm Si
GaN on Si HEMT thickness uniformity 0.44 % standard deviation without edge exclusion.
Mean thickness 3.37 µm.

The AIXTRON Group provides deposition equipment to the semiconductor industry. They are used for a wide range of manufacturing high-performance components for electronic and optoelectronic applications based on compound or organic semiconductor materials. These components are used in a variety of innovative applications, technologies and industries. These include, for example, LED and display technology, data transmission, sensor technology, energy management and conversion, communication, signal and lighting technology, and many other sophisticated high-tech applications.

AIX G5+ C

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