概述

The AIXTRON G4 HT (High-Temperature) is a state-of-the-art metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This advanced system is specifically designed for epitaxial growth of compound semiconductor materials, with a particular focus on applications that require high-temperature processing. Its precise and controlled growth capabilities enable the creation of high-quality semiconductor layers, making it a vital tool for manufacturing cutting-edge optoelectronic devices, high-power transistors, and other semiconductor components requiring high-temperature processing for superior performance.