描述
無描述配置
Software Version CACE 3.5.0286 PLC 3.65+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 12 x 3" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1 Hydride Sources PH3 x 2, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison2 x 3 for TMIn, Epison2 x 1 for DIPTe Chiller Baths 4 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SD90V3 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 3” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry ‐ Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 代工型號說明
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類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125708
晶圓尺寸:
3"/75mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AIXTRON
AIX 2600 G3
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125708
晶圓尺寸:
3"/75mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Software Version CACE 3.5.0286 PLC 3.65+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 12 x 3" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, DIPTe x 1 Hydride Sources PH3 x 2, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison2 x 3 for TMIn, Epison2 x 1 for DIPTe Chiller Baths 4 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SD90V3 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 3” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry ‐ Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 代工型號說明
未提供文檔
無文檔