描述
無描述配置
Software Version CACE 3.5.0286 PLC 3.64+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths 3 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 代工型號說明
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無文檔
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125709
晶圓尺寸:
6"/150mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AIXTRON
AIX 2600 G3
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125709
晶圓尺寸:
6"/150mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Software Version CACE 3.5.0286 PLC 3.64+ SLC 2.01 Process AlInGaP MOCVD Epitaxy Wafer Config & Size 7 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TMAl x 1, Cp2Mg x 1, CBr4 x 1 Hydride Sources PH3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1 Concentration Monitors Epison5 x 3 for TMIn Chiller Baths 3 available for MO Sources Purifiers Entegris getter for H2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 80/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Kashiyama SDE300 DOR & Glove Box Pumps Adixen ACP ‐ 15G x 2 Spare Parts Potentially some available Aixtron 2600 G3 MOCVD Reactor Specifications 6” Abatement Custom Built Wet/Dry Burn Abatement System Reactor Chiller Affinity Recirculating Closed Loop Chiller Ceiling Quartz Ceiling with temperature control In‐Situ Pyrometry Laytec EpiTT with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Active Spare Channels Yes ‐ TBDOEM 代工型號說明
未提供文檔
無文檔