描述
無描述配置
Model 2600 G3 HT IC Software Version AIXACT 7.4.1.9 PLC 3.12.1 SLC ‐ Process InGaN MOCVD Epitaxy Wafer Config & Size 6 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TEGax2, TMAl x 1, Cp2Mg x 1, future x 3 Hydride Sources NH3 x 3, 100 ppm SiH4 in Ar x 2, future x 2 Concentration Monitors Epison4 x 3 for TMIn, Epison4 x 1 for TMAl Chiller Baths 6 available for MO Sources Purifiers Entegris getters for NH3, H2 & N2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Ebara ESA70W or ESA80W DOR & Glove Box Pumps Adixen ACP‐15(G) x 2 Aixtron 2600 G3 HT IC MOCVD Reactor Specifications Abatement Unisem UN2000A‐WHG (single or shared across 2 reactors) Reactor Chiller Tek‐Temp Recirculating Closed Loop Chiller Ceiling Ceiling temperature control. Custom Built Automatic Ceiling Loader In‐Situ Pyrometry Laytec Pyro400 with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Individual GFR control for each puck Spare Channels 23 spare MFC channels & 10 spare valve output channels Spare Parts Potentially some availableOEM 代工型號說明
AIX 2600 G3, could accommodate 24 2-inch wafers.文檔
無文檔
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125705
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AIXTRON
AIX 2600 G3 HT
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125705
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Model 2600 G3 HT IC Software Version AIXACT 7.4.1.9 PLC 3.12.1 SLC ‐ Process InGaN MOCVD Epitaxy Wafer Config & Size 6 x 6" Metal Organic Sources TMIn x 3, TMGa x 2, TEGax2, TMAl x 1, Cp2Mg x 1, future x 3 Hydride Sources NH3 x 3, 100 ppm SiH4 in Ar x 2, future x 2 Concentration Monitors Epison4 x 3 for TMIn, Epison4 x 1 for TMAl Chiller Baths 6 available for MO Sources Purifiers Entegris getters for NH3, H2 & N2 Filters ‐ Heating System RF Coil with Trumpf Huttinger RF Generator BIG 120/50 Glove Box MBraun Nitrogen Glovebox with controller Exhaust System Custom Built Exhaust System Process Pump Ebara ESA70W or ESA80W DOR & Glove Box Pumps Adixen ACP‐15(G) x 2 Aixtron 2600 G3 HT IC MOCVD Reactor Specifications Abatement Unisem UN2000A‐WHG (single or shared across 2 reactors) Reactor Chiller Tek‐Temp Recirculating Closed Loop Chiller Ceiling Ceiling temperature control. Custom Built Automatic Ceiling Loader In‐Situ Pyrometry Laytec Pyro400 with EpiNET 2.2 for feedback temperature control Gas Foil Rotation (GFR) Individual GFR control for each puck Spare Channels 23 spare MFC channels & 10 spare valve output channels Spare Parts Potentially some availableOEM 代工型號說明
AIX 2600 G3, could accommodate 24 2-inch wafers.文檔
無文檔