概述

PROVE® neXT offers proven best in class repeatability and accuracy for mask manufacturing as well as Multibeam and VSB calibration. It works with a litho-grade 193nm optics for lowest aberrations. The system offers a better resolution than any other optical registration measurement tool with an NA of 0.8 for the measurement of smallest production features. All types of photo and nano–imprint masks can be precisely measured without loss of image contrast. A fast throughput can be realized for all measurement tasks including local registration map (LRM).