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The TWIN SC-3 is a product of PVA TePla America, LLC, a company that focuses on developing systems for vacuum, high-temperature, and plasma processes, as well as quality inspections. This product is used to monitor the implant dosage on wafers up to 300mm in size. The implant process is an essential step in the production of integrated circuits because it determines the characteristics and properties of the devices by doping specific layers of the silicon substrate. The TWIN SC-3 can measure dose levels ranging from 10E10 to 5E16 at implant energy levels from 1keV to 100 MeV.
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