概述

ASPECT is a metrology system designed for future memory architectures and scaling strategies, with the ability to handle memory stacks well over 200 pairs. It uses a revolutionary infrared optical system to provide full profiling capability, enabling critical etch and deposition control. The system is faster and has better process coverage than X-ray systems, making it ideal for applications such as etch, cleans, and deposition for Gen7 3D NAND and beyond, etch and implant for CIS and DRAM, and on-device materials characterization for advanced logic. Its superior performance has been demonstrated across multiple customer devices.