概述

The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.