概述

The VIISta HE is a single-wafer high energy implanter by Varian Semiconductor. It is popular for high volume DRAM production and serves a range of semiconductor implant applications. It features True Zero degree implant, low contamination, and outstanding process accuracy. The True Zero capability provides an advantage for increased device packing density in high-performance devices. The VIISta HE offers excellent productivity, uniformity, angle control, and medium current back-up flexibility. It covers retrograde well, triple well, buried layers, and pocket applications.