概述

The MA 1006 TSA, MA 1006 TSA/BSA and MA 1006 TSA/I R mask aligners are designed for high resolution photolithography in a laboratory, development, or pilot production environment. They offer unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness as well as standard size wafers up to 150mm diameter. All mask aligner of the MA 1006 series are partly motorised with a very easy-to-use user panel. The adjustment is done by micrometer screws. Both, screw and user panel are designed for best ergonomic position. For most accurate alignment, each step of alignment can be viewed on a monitor using a splitfield microscope in combination with a CCD camera for bottom side alignment and a high resolution splitfield microscope for top side alignment. The MA 1006 is a compact mask aligner in a modular assembly design which allows a very easy maintenance procedure. The functional groups are easily accessible and the subassemblies can be quickly exchanged.