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CANON MPA 600
    描述
    Canon Aligner (Projection)
    配置
    無配置
    OEM 代工型號說明
    The Canon MPA-600 FA is a one-to-one projection aligner for 6" wafers. It uses a high intensity Mercury lamp to expose the wafer through a mask plate and a series of mirrors. The wafer scans horizontally through an arc of light at a specified scan speed to expose the light-sensitive positive photoresist that was coated onto the wafer. The Canon MPA-600 FA has a wafer size of 5 or 6 inches and a mask size of 6 or 7 inches square. It uses a projection mirror with a magnification of 1X and an illuminator that is a 2kW super high pressure mercury lamp. The exposure wavelengths used are 365 nm (i-line), 405 nm (h-line), and 436 nm (g-line). The resolution is 2.5 um over the entire 6 inch surface and the depth of focus is more than +/- 6 um at linewidth 1.5 um. The alignment accuracy is 3 sigma, < or = 0.6 um.
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    CANON

    MPA 600

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    Mask Aligner
    上次驗證: 超過60天前
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    Used


    作業狀態:

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    產品編號:

    51097


    晶圓尺寸:

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    年份:

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    CANON MPA 600
    CANONMPA 600Mask Aligner
    年份: 0條件: 二手
    上次驗證超過60天前

    CANON

    MPA 600

    verified-listing-icon

    已驗證

    類別

    Mask Aligner
    上次驗證: 超過60天前
    listing-photo-0ce6ebb0185b4d94ba2624f349b434aa-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    51097


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Canon Aligner (Projection)
    配置
    無配置
    OEM 代工型號說明
    The Canon MPA-600 FA is a one-to-one projection aligner for 6" wafers. It uses a high intensity Mercury lamp to expose the wafer through a mask plate and a series of mirrors. The wafer scans horizontally through an arc of light at a specified scan speed to expose the light-sensitive positive photoresist that was coated onto the wafer. The Canon MPA-600 FA has a wafer size of 5 or 6 inches and a mask size of 6 or 7 inches square. It uses a projection mirror with a magnification of 1X and an illuminator that is a 2kW super high pressure mercury lamp. The exposure wavelengths used are 365 nm (i-line), 405 nm (h-line), and 436 nm (g-line). The resolution is 2.5 um over the entire 6 inch surface and the depth of focus is more than +/- 6 um at linewidth 1.5 um. The alignment accuracy is 3 sigma, < or = 0.6 um.
    文檔

    無文檔

    類似上架商品
    查看全部
    CANON MPA 600
    CANON
    MPA 600
    Mask Aligner年份: 0條件: 二手上次驗證: 超過60天前