描述
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace配置
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEM 代工型號說明
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.文檔
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APPLIED MATERIALS (AMAT)
CENTURA SINGEN
已驗證
類別
LPCVD Poly
上次驗證: 超過30天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
未知
產品編號:
93181
晶圓尺寸:
未知
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
類別
LPCVD Poly
上次驗證: 超過30天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
未知
產品編號:
93181
晶圓尺寸:
未知
年份:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace配置
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEM 代工型號說明
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.文檔
無文檔