描述
Low/Ultra Low Energy Implanter配置
無配置OEM 代工型號說明
Designed for the 300mm market, Quantum is an advanced ion implanter series that utilizes the differential lens technology of the xRLEAP system. It offers enhanced beam optics, resulting in improved low-energy productivity compared to the xRLEAP system. With high beam currents and fast auto-tune capability, Quantum is the industry's most effective ion implanter for applications at 130nm and below. Its new energy control technology ensures excellent energy accuracy and enables ultra-low energy implants with remarkable precision of ±7.5 volts. The This system provides conductive doping for multiple device generations, offering a small-footprint platform for both 200mm and 300mm wafer sizes. The Quantum series excels at low-energy implantation while delivering excellent performance in mid-energy implants (10-80keV). With high current levels, it achieves high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has gained rapid acceptance among chipmakers worldwide for its ability to form ultra-shallow junctions, enabling smaller transistors and higher device speeds.文檔
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APPLIED MATERIALS (AMAT)
QUANTUM II LEAP
已驗證
類別
Low Energy
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91868
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
QUANTUM II LEAP
類別
Low Energy
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
91868
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Low/Ultra Low Energy Implanter配置
無配置OEM 代工型號說明
Designed for the 300mm market, Quantum is an advanced ion implanter series that utilizes the differential lens technology of the xRLEAP system. It offers enhanced beam optics, resulting in improved low-energy productivity compared to the xRLEAP system. With high beam currents and fast auto-tune capability, Quantum is the industry's most effective ion implanter for applications at 130nm and below. Its new energy control technology ensures excellent energy accuracy and enables ultra-low energy implants with remarkable precision of ±7.5 volts. The This system provides conductive doping for multiple device generations, offering a small-footprint platform for both 200mm and 300mm wafer sizes. The Quantum series excels at low-energy implantation while delivering excellent performance in mid-energy implants (10-80keV). With high current levels, it achieves high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has gained rapid acceptance among chipmakers worldwide for its ability to form ultra-shallow junctions, enabling smaller transistors and higher device speeds.文檔
無文檔