描述
E-beam Lithography配置
• 50 keV beam energy LaB6 gun • High-precision stage featuring a traverse range of 210mm X 210mm • Lambda/1024 (0.6nm) laser interferometer resolution for position measurement • Fully automated Outer Handling System (OHS) to perform Pod-to-Pod (SMIF) substrate handling including pre-alignment of substrates • OHS is equipped with two (2) loadports for up to 150mm wafers, interfaced to an ISO class 4 mini environment which can be prepared for CAR on request (amine filter) • OHS has storage capacity of up to 10 holders (holder library) • Four (4) titanium wafer holders for 10mm wafers equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness and Four titanium holders for 150mm equipped with ESC (two holders for GaAs and GaN each, due to different wafer thickness. • OHS to allow automated wafer handling directly from customer wafer carriers via SMIF pods. • High speed variable shape beam and vector scan writing principle • High throughput "write-on-the-fly" working principle • Multi-pass writing • Minimum writing address grid: 1nm • Pattern data storage capacity by a RAID system of 2 Tbyte • Sbvis: visualization software for pattern data formats • Mark Detection Software Package (MDSP) including Image Field MetricOEM 代工型號說明
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VISTEC
SB254
已驗證
類別
Lithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
116430
晶圓尺寸:
6"/150mm
年份:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VISTEC
SB254
類別
Lithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
116430
晶圓尺寸:
6"/150mm
年份:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available