描述
Raith 150-TWO Electron Beam Lithography System, configured for 6in wafer, Zeiss Ultra-55 SEM base 208-240V, w/ HiTek G303/51 HV power supply, LISO laser head, BB-8KV beam blank controller, TBMS precision stage controller, Elphy VII high speed pattern processor, loadlock controller, laser interferometer source, Keithley 6485 picoammeter, Evactron 10 RF plasma cleaner, RT control & motor control pendants ncludes: Thermo Neslab Merlin M75 recirculating chiller配置
無配置OEM 代工型號說明
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文檔
無文檔
RAITH
150 TWO
類別
Lithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
135810
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Raith 150-TWO Electron Beam Lithography System, configured for 6in wafer, Zeiss Ultra-55 SEM base 208-240V, w/ HiTek G303/51 HV power supply, LISO laser head, BB-8KV beam blank controller, TBMS precision stage controller, Elphy VII high speed pattern processor, loadlock controller, laser interferometer source, Keithley 6485 picoammeter, Evactron 10 RF plasma cleaner, RT control & motor control pendants ncludes: Thermo Neslab Merlin M75 recirculating chiller配置
無配置OEM 代工型號說明
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文檔
無文檔