概述

The IH-860 and IH-860P are high-energy ion implanters that provide stable implant up to 1,290keV for triple charged ions. They are compact in size, equivalent to a 200-keV medium current one, and incorporate dual end-station for high productivity. These implanters are designed to ensure high productivity not only in high-energy regions but even in the energy regions of 200ke-V devices.