Designs, manufactures and services ion implantation and other processing equipment used in the fabrication of semiconductor chips.

AXCELIS

The AXCELIS NV 10-160 is a high-energy ion implanter, specifically designed for implanting ions into bare silicon wafers. It operates at 60 keV energy, and its implantation process allows for precise dosing in the range of 1 to 5∙10^15 ions per square centimeter. After implantation, the wafers can be annealed at 600°C for 20 minutes to activate and optimize the implanted ions' performance. The AXCELIS NV 10-160 is a powerful tool used in semiconductor manufacturing for creating controlled doping profiles and modifying material properties in silicon wafers, essential for producing advanced semiconductor devices.

NV 10 160

AXCELIS

NV 10 160

Medium Current

類似上架商品

AXCELIS

NV 10 160

NV 10 160

Medium Current

類似上架商品

AXCELIS

NV 10 160