NV 10 160
概述
The Eaton Nova NV-10-160 is a high energy Ion Implanter. Bare silicon wafers were implanted in an Eaton Nova 10-160 ion implanter at 60 keV energy with doses in the range 1-5∙1015cm-2 and annealed at 600°C for 20 min.
活躍中的上架商品
1
服務
檢驗、保險、評估、物流
